ALD 3D
Trench in silicon coated with Al2O3
The ALD 3D processes use the process of plasma enhanced atomic layer deposition (PEALD) to coat plastics, ceramics, glasses or metals.
The PEALD coatings have the advantage of a very homogeneous thickness which is independent of the geometric shape of the surface. It is also possible to coat holes with aspect ratios up to 100 : 1 (depth : with).
The ALD 3D processes can be used to coat parts with a maximal size of 150 × 150 × 150 mm. A special feature is that the parts can have almost any 3D form while of course also flat substrates are possible.
Typical coatings are:
Because of the plasma the ALD process temperature can be kept far below 100 °C. It is therefore possible to coat also temperature sensitive surfaces and materials.
For further information about this topic see this article (in German).
The PEALD coatings have the advantage of a very homogeneous thickness which is independent of the geometric shape of the surface. It is also possible to coat holes with aspect ratios up to 100 : 1 (depth : with).
The ALD 3D processes can be used to coat parts with a maximal size of 150 × 150 × 150 mm. A special feature is that the parts can have almost any 3D form while of course also flat substrates are possible.
Typical coatings are:
- Oxide coatings as barrier against molecules and gases of all kind
- Oxide- or Nitride coatings with exactly defined optical properties
- Coatings as high-k-dielectric
- Corrosion protection coatings
Because of the plasma the ALD process temperature can be kept far below 100 °C. It is therefore possible to coat also temperature sensitive surfaces and materials.
For further information about this topic see this article (in German).
| Basic properties | |
|---|---|
| Possible coatings | Al2O3, SiO2, TiO2, Ta2O5, Si3N4, HfO2 |
| Possible substrates | plastics, metals, ceramics, glass, semiconductors |
| Process temperature | 20 - 50 °C |