ALD 3D

The ALD 3D processes use the process of plasma enhanced atomic layer deposition (PEALD) to coat plastics, ceramics, glasses or metals.
The PEALD coatings have the advantage of a very homogeneous thickness which is independent of the geometric shape of the surface. It is also possible to coat holes with aspect ratios up to 100 : 1 (depth : with).
The ALD 3D processes can be used to coat parts with a maximal size of 150 × 150 × 150 mm. A special feature is that the parts can have almost any 3D form while of course also flat substrates are possible.
Typical coatings are:
Because of the plasma the ALD process temperature can be kept far below 100 °C. It is therefore possible to coat also temperature sensitive surfaces and materials.
For further information about this topic see this article (in German).
The PEALD coatings have the advantage of a very homogeneous thickness which is independent of the geometric shape of the surface. It is also possible to coat holes with aspect ratios up to 100 : 1 (depth : with).
The ALD 3D processes can be used to coat parts with a maximal size of 150 × 150 × 150 mm. A special feature is that the parts can have almost any 3D form while of course also flat substrates are possible.
Typical coatings are:
- Oxide coatings as barrier against molecules and gases of all kind
- Oxide- or Nitride coatings with exactly defined optical properties
- Coatings as high-k-dielectric
- Corrosion protection coatings
Because of the plasma the ALD process temperature can be kept far below 100 °C. It is therefore possible to coat also temperature sensitive surfaces and materials.
For further information about this topic see this article (in German).
Basic properties | |
---|---|
Possible coatings | Al2O3, SiO2, TiO2, Ta2O5, Si3N4, HfO2 |
Possible substrates | plastics, metals, ceramics, glass, semiconductors |
Process temperature | 20 - 50 °C |